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Journal of the Japan Society for Precision Engineering
This paper discusses a new concept of wafer stage system for step and repeat type aligner. High rigidity of stage mechanism and high gain of stage control system are required to improve accuracy and acting time of stage positioning. But as wafer size becomes large and the massdoi:10.2493/jjspe.57.2213 fatcat:evb5s4s5pjd3bofw3xj5dtnvpy