A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2017; you can also visit the original URL.
The file type is application/pdf.
Development of Stage System for Aligner(1st Report). Basic Performance in Case of Using Separated Fine Stage System
アライナ用ステージシステムの開発(第1報) 粗微動分離方式を適用した場合の基本特性
1991
Journal of the Japan Society for Precision Engineering
アライナ用ステージシステムの開発(第1報) 粗微動分離方式を適用した場合の基本特性
Preserved Fulltext
This paper discusses a new concept of wafer stage system for step and repeat type aligner. High rigidity of stage mechanism and high gain of stage control system are required to improve accuracy and acting time of stage positioning. But as wafer size becomes large and the mass
doi:10.2493/jjspe.57.2213
fatcat:evb5s4s5pjd3bofw3xj5dtnvpy