Nanoimprint lithography can be used as a tool for semiconductor lithography. However, problems still remain in respect of the thickness of the residual layer. Liquid-transfer imprint lithography (LTIL) is one candidate for solving such problems. The principle of LTIL involves partial removal of the UV-curable resin in the liquid phase, permitting control of the thickness of the resin layer on the film mold. After removal of the excess resin, the film mold with a thin layer of UV-curable resin

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... contacted with the target substrate. This process is very simple, permitting its application in various methods and with various types of equipment, such as roll-to-substrate, roll press, or roll-to-roll machinery. Several types of resin-removal and stacking methods are possible. The machinery and associated techniques have a wide range of applications. LTIL has considerable potential, because transfer with no residual layer is possible, a result that is very useful in semiconductor lithography.