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Aspheric optical surfaces are often tested using computergenerated holograms (CGHs). The etching of the CGH pattern must be highly accurate to create desired wavefronts. Variations of line width, etching depth, and surface roughness cause unwanted wavefront errors. The sensitivity to these manufacturing errors is studied using scalar diffraction analysis. We provide a parametric model that can be used for optimizing the CGH design to give good diffraction efficiency and limited sensitivity todoi:10.1364/oe.15.015410 pmid:19550826 fatcat:6dfcvykucvf5rdntpzoyq6pr4m