Room Temperature Fabrication of Thin Oxide Films by Laser Induced Metalorganic Chemical Vapor Deposition

1995 The Review of Laser Engineering  
Fabrication mechanisms of thin oxide films have been investigated by using the excimer laser induced metalorganic vapor deposition (Laser-MOCVD) method without heating substrates. TiO2 and PbO films are successfully obtained on (100) Si substrates from their parent metalorganics, Ti(O-iC3H7)4 and (C2H5)3PbOCH2C(CH3)3 , respectively. A ZrO2 film is notf ormed from Zr(O-tC4H9)4. The laser wavelength and irradiation angle dependence measurements indicate that film formation proceeds via light
more » ... ption of the metalorganic species adsorbed on the substrates. The existence of one-photon process in the TiO2 film formation is assured by laser fluence dependence measurements . The maximum growth rate, 0.05 A per laser pulse, of TiO2 film obtained in the experiments is compared with a rough estimation by a surface reaction model. The model can essentially explain the slow growth rate from the small absorption cross section of the metalorganics and the mild fluence of laser irradiation .
doi:10.2184/lsj.23.355 fatcat:lus7cduij5dsbnpk3xflxsznsa