A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2018; you can also visit the original URL.
The file type is
Room Temperature Fabrication of Thin Oxide Films by Laser Induced Metalorganic Chemical Vapor Deposition
The Review of Laser Engineering
Fabrication mechanisms of thin oxide films have been investigated by using the excimer laser induced metalorganic vapor deposition (Laser-MOCVD) method without heating substrates. TiO2 and PbO films are successfully obtained on (100) Si substrates from their parent metalorganics, Ti(O-iC3H7)4 and (C2H5)3PbOCH2C(CH3)3 , respectively. A ZrO2 film is notf ormed from Zr(O-tC4H9)4. The laser wavelength and irradiation angle dependence measurements indicate that film formation proceeds via lightdoi:10.2184/lsj.23.355 fatcat:lus7cduij5dsbnpk3xflxsznsa