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One of the most crucial emerging challenges in Lithography is achieving rapid and accurate alignment under a wide variety of conditions brought about by different processing steps. Current alignment algorithms assume symmetric alignment signals. In this paper, we propose a new algorithm based on subspace decomposition of alignment signals. We assume that the process-induced asymmetries are small enough so that only linear effects need to be considered. We first find the subspace of alignmentdoi:10.1109/icassp.1998.681436 dblp:conf/icassp/GhazanfarianCKMP98 fatcat:vn2v6fw2xjditg6hkiaudsdexe