Plasma hydrogenation of strained Si∕SiGe∕Si heterostructure for layer transfer without ion implantation

Lin Shao, Yuan Lin, J. K. Lee, Q. X. Jia, Yongqiang Wang, M. Nastasi, Phillip E. Thompson, N. David Theodore, Paul K. Chu, T. L. Alford, J. W. Mayer, Peng Chen (+1 others)
2005 Applied Physics Letters  
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doi:10.1063/1.2032602 fatcat:zjmkyzcjojen5h77djh7pkqy5i