Optical properties of a Si binary optic microlens for infrared ray

K. Fujikawa, G. Hirakawa, T. Shiono, K. Nomura
Proceedings IEEE The Tenth Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots  
We established fabrication technologies of a binary optic microlens. Especially, Si etch rate of 1.5 pm/min and Si / photoresist selectivity of 40 were achieved when the RIE parameters were a ratio of 0, in the SF,-0, etching gas of 0.2 at a pressure of 100 mTorr and an rf power density of 0.2 W/cm2. We also obtained good optical properties for a micro pyroelectric infrared sensor constructed with a Si binary optic microlens. A response of four-phase is 1.9 times and eight-phase is 2.4 times
more » ... ger than two-phase respectively. These results nearly agree with the ratio of the simulation of the each phase microlens diffraction efficiency respectively. 0-7803-3744-1/97/$5.00 0 1997 IEEE
doi:10.1109/memsys.1997.581856 fatcat:lxqizuq6ezckxbood3q74ollta