Non-destructive observation of stacking faults of silicon-wafer by means of photoacoustic microscopy

Masanobu KASAI, Hiromichi SHIMIZU, Tsuguo SAWADA, Yohichi GOHSHI
1985 Analytical Sciences  
The inspections of stacking faults of Si-wafer were carried out by means of a home-made photoacoustic microscopy (PAM). The stacking faults, which are not observed by an optical microscope, could be measured non-destructively and the depth of stacking faults beneath the surface could also be estimated by PAM.
doi:10.2116/analsci.1.107 fatcat:2chkoq7glrda3he3qhkkiswv7y