Feasibility Study on High-Sensitivity Chemically Amplified Resist by Polymer Absorption Enhancement in Extreme Ultraviolet Lithography

Takahiro Kozawa, Kazumasa Okamoto, Jun Nakamura, Seiichi Tagawa
2008 Applied Physics Express  
doi:10.1143/apex.1.067012 fatcat:ajlzbq32gzhstjzwccfwdpi23q