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Characterization and Electrical Property of Impurity Concentration in Ge-N Codoped SiC Crystals
2018
Journal of Inorganic Materials
2-inch Ge-N codoped and Ge doped SiC single crystals were grown by physical vapor transport (PVT) method. And the SiC ingots were fabricated into 10 mm10 mm SiC wafers for characterization. Semiconductor technology was used to fabricate Ti/Pt/Au metal contact on the carbide-terminated face of SiC wafers. Subsequently, all samples were characterized by secondary ion mass spectrometry (SIMS) and Hall measurements. The SIMS results showed that Ge-N codoping method could enhance the Ge doping
doi:10.15541/jim20170256
fatcat:44z3j3epibaqba73nagz7gclau