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Device and Process Technologies for MEMS and Microelectronics
Slow neutral beams of metal atoms can be manipulated using the intensity gradient of near-resonant light-fields enabling the deposition of atoms onto a substrate in a processes often referred to as atom lithography. A suitably shaped light-field gradient is used to control the path of metal atoms using the dipole force created by the interaction between atoms and the strong, near-resonant optical intensity gradient. Relatively simple patterns such as lines and dots have been created usingdoi:10.1117/12.364493 fatcat:2ew646pdfbc3zonn6jodpai2vi