Microelectromechanical (MEMS) structures consisting of surface micromachined disk resonators of phosphorousdoped hydrogenated amorphous silicon (n-a-Si:H) deposited by radiofrequency plasma enhanced chemical vapour deposition (RF-PECVD) were fabricated and characterized. Quality factors up to 10 4 in vacuum were measured for disk resonators operating at frequencies between 0.1 and 10 MHz. The metallized structures were actuated with electrostatic force by radially placed electrodes. Finite

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... nt simulations were used to identify the type of vibrational modes present and show good agreement with measured values. Resonator geometry and ambient pressure were varied to attain a generalized understanding of the RF performance. Higher harmonic modes show increasing quality factors which bears great potential when designing sensors for operation in dissipative media.