Development of catalytic chemical vapor deposition equipment for large substrates
大面積触媒CVD装置の開発

Shuji OSONO, Makiko KITAZOE, Hideo TSUBOI, Shin ASARI, Kazuya SAITO
Oyobuturi  
doi:10.11470/oubutsu.73.7_935 fatcat:fwsobzvvvfd3faiahdfzytjnam