We present a low-temperature post-processing module, utilizing polyimide as a sacrificial layer and novel materials such as PECVD SiC and metals (sputtered aluminium and titanium) as structural layers. The use of spin-on polyimide allows an all-dry final release step overcoming stiction problems often encountered in wet sacrificial etching processes. The spinning and curing procedure has been tailored to the specific needs of the IC-compatible post-process module. For the patterning of the

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... mide, thin films of aluminium, PECVD silicon oxide or silicon carbide are employed as a mask layer. Anisotropic etching of the mask film and of the polyimide layer is accomplished by RIE. After patterning the structural layer, sacrificial etching of the polyimide is done using an isotropic dry etch process in high-density oxygen plasma. An underetch rate of 4 µm min −1 is achieved. Compatibility with different structural materials is tested and test structures are designed and realized in a fully post-processing surface micromachining module.