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Observation of disorder-induced weakening of electron-phonon interaction in thin noble-metal films

J. T. Karvonen, L. J. Taskinen, I. J. Maasilta
2005 Physical Review B  

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2005 accepted arXiv:cond-mat/0311031v3 fatcat:o3twaw62lnfvtpiv6tr3ttjg3a

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2004 pre-print
arXiv:cond-mat/0311031v2 fatcat:gvoeehpzybbbthu5bfyniaxshm
2003 pre-print
arXiv:cond-mat/0311031v1 fatcat:prk4s7kt3ngr3dxhp33k6nwvwy
We have used symmetric normal metal-insulator-superconductor (NIS) tunnel junction pairs, known as SINIS structures, for ultrasensitive thermometry in the temperature range 50 - 700 mK. By Joule heating the electron gas and measuring the electron temperature, we show that the electron-phonon (e-p) scattering rate in the simplest noble metal disordered thin films (Cu,Au) follows a T^4 temperature dependence, leading to a stronger decoupling of the electron gas from the lattice at the lowest
more » ... ratures. This power law is indicative e-p coupling mediated by vibrating disorder, in contrast to the previously observed T^3 and T^2 laws.
doi:10.1103/physrevb.72.012302 fatcat:c4sepdohg5e3jie62x4ysgb3om
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J. T. Karvonen, L. J. Taskinen, I. J. Maasilta. "Observation of disorder-induced weakening of electron-phonon interaction in thin noble-metal films." Physical Review B 72.1 (2005)