Run-to-run control framework for VLSI manufacturing

James R. Moyne, Hossein Etemad, Michael E. Elta, James A. Bondur, Kiefer Elliott, John R. Hauser, Dim-Lee Kwong, Asit K. Ray
1994 Microelectronic Processes, Sensors, and Controls  
A framework has been developed for the Run-to-Run (R2R) control and optimization of VLSI manufacturing processes. The framework is one component of the Michigan Sequential Control and OPtimization Environment (M-SCOPE). M-SCOPE in-turn is part of a multi-level control system that includes real-time equipment and process control as well as pseudo-real-time process control components, operating in conjunction with the sequential control component. A feasibility implementation of the R2R framework
more » ... has been developed for the optimization and control of a plasma etching process in a Reactive Ion Etcher. Results indicate process control robustness and improved process control versus open loop operation.
doi:10.1117/12.167358 fatcat:7l3cxwkzfvhg5njozd4h22ueki