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Influence of Ar Gas Pressure On The Structural And Optical Properties And Surface Topography of Al-Doped ZnO Thin Films Sputtered By DC-Magnetron Sputtering Method
[post]
2021
unpublished
In this work, Aluminum doped Zinc oxide thin films were sputtered on glass substrate by the direct current (DC) magnetron sputtering method. The influence of Ar gas pressure on the structural and optical properties was measured. The optical parameters were calculated by UV- Visible spectroscopy, the nature of transition reveals direct allowed transition for the prepared films. Also, some physical quantities such as the strength of electron-phonon interaction, dissipation factor (tanδ) in the
doi:10.21203/rs.3.rs-691578/v1
fatcat:daat7xw2kfcqzedof3dpzgsiea