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Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
Recently TNO has established EBL2; an exposure and analysis facility for testing EUV optics, reticles and pellicles under relevant EUV scanner and source conditions. The facility and EUV source complies with the ASML power roadmap of EUV systems up to a power of 500 W IF. This enables life time testing of EUV optics, reticles and pellicles under conditions which are not yet available to industry, helping the industry in preparing for HVM production. The EBL2 facility consists of a EUV source,doi:10.1117/12.2279025 fatcat:uu5qhtb5ujh27pt5enxtry6sh4