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Monocrystalline NbN nanofilms on a 3C-SiC∕Si substrate
2007
Applied Physics Letters
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The authors have realized NbN ͑100͒ nanofilms on a 3C-SiC ͑100͒/Si͑100͒ substrate by dc reactive magnetron sputtering at 800°C. High-resolution transmission electron microscopy ͑HRTEM͒ is used to characterize the films, showing a monocrystalline structure and confirming epitaxial growth on the 3C-SiC layer. A film ranging in thickness from 3.4 to 4.1 nm shows a superconducting transition temperature of 11.8 K, which is the highest reported for NbN films of comparable thickness. The NbN
doi:10.1063/1.2766963
fatcat:wactfgt3wfevzdtqzuxevgbirq