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Bismuth manganese oxide (BiMnO 3 ) thin films were grown on Si (100) and Si (111) substrates by RF magnetron sputtering. The properties of grown films were analyzed by X-ray diffraction (XRD), Energy dispersive analysis of X-ray Spectrum (EDX), Atomic force microscopy (AFM) and Vibrating sample magnetometer (VSM). The XRD result reveals that BiMnO 3 (BMO) thin films on both the substrates are polycrystalline in nature with monoclinic structure, however the films on Si (100) showed betterdoi:10.1016/j.phpro.2013.10.025 fatcat:m3w57gxoijav5jpzehkqorjcfe