A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2010; you can also visit <a rel="external noopener" href="http://www.rit.edu/kgcoe/microsystems/lithography/research/immersion/SPIE_5040_58_immersion.pdf">the original URL</a>. The file type is <code>application/pdf</code>.
Water immersion optical lithography for 45-nm node
<span title="2003-06-25">2003</span>
<i title="SPIE">
Optical Microlithography XVI
</i>
Preserved Fulltext
It is possible to extend optical lithography by using immersion imaging methods. Historically, the application of immersion optics to microlithography has not been seriously pursued because of the alternative solutions available. As the challenges of shorter wavelength become increasingly difficult, immersion imaging becomes more feasible. We present results from research into 193nm excimer laser immersion lithography at extreme propagation angles (such as those produces with strong OAI and
<span class="external-identifiers">
<a target="_blank" rel="external noopener noreferrer" href="https://doi.org/10.1117/12.485489">doi:10.1117/12.485489</a>
<a target="_blank" rel="external noopener" href="https://fatcat.wiki/release/65w3wvfupzer3kdrvbrwet6kei">fatcat:65w3wvfupzer3kdrvbrwet6kei</a>
</span>
more »
... . This is being carried out in a fluid that is most compatible in a manufacturable process, namely water. By designing a system around the optical properties of water, we are able to image with wavelengths down to 193nm. Measured absorption is below 0.50 cm -1 at 185nm and below 0.05 cm -1 at 193nm. Furthermore, through the development of oblique angle imaging, numerical apertures approaching 1.0 in air and 1.44 in water are feasible. The refractive index of water at 193nm (1.44) allows for exploration of the following: 1. k 1 values approaching 0.17 and optical lithography approaching 35nm. 2. Polarization effects at oblique angles (extreme NA). 3. Immersion and photoresist interactions with polarization. 4. Immersion fluid composition, temperature, flow, and micro-bubble influence on optical properties (index, absorption, aberration, birefringence). 5. Mechanical requirements for imaging, scanning, and wafer transport in a water media. 6. Synthesizing conventional projection imaging via interferometric imaging.
<a target="_blank" rel="noopener" href="https://web.archive.org/web/20100717103650/http://www.rit.edu/kgcoe/microsystems/lithography/research/immersion/SPIE_5040_58_immersion.pdf" title="fulltext PDF download" data-goatcounter-click="serp-fulltext" data-goatcounter-title="serp-fulltext">
<button class="ui simple right pointing dropdown compact black labeled icon button serp-button">
<i class="icon ia-icon"></i>
Web Archive
[PDF]
<div class="menu fulltext-thumbnail">
<img src="https://blobs.fatcat.wiki/thumbnail/pdf/76/43/764314613af0657ccb101d3e0ef5886868b7ed90.180px.jpg" alt="fulltext thumbnail" loading="lazy">
</div>
</button>
</a>
<a target="_blank" rel="external noopener noreferrer" href="https://doi.org/10.1117/12.485489">
<button class="ui left aligned compact blue labeled icon button serp-button">
<i class="external alternate icon"></i>
Publisher / doi.org
</button>
</a>