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Atomic Oxygen Effect on Sputtered MoS2-Ag Composite Film
2017
DEStech Transactions on Engineering and Technology Research
MoS 2 -Ag composite film was co-deposited by rf-sputtering technology and irradiated by atomic oxygen (AO) using a ground AO simulation facility. The structure, morphology, composition and tribological property of the composite films before and after the AO irradiation were investigated using X-ray diffraction (XRD), field emission scanning electron microscope (FESEM), X-ray photoelectron spectroscope (XPS) and ball-on-disk tribometer, respectively. The results revealed that the MoS 2 -Ag
doi:10.12783/dtetr/apetc2017/11096
fatcat:c3mvarynobcgxnq6drvyaq46pa