Provably good and practically efficient algorithms for CMP dummy fill

Chunyang Feng, Hai Zhou, Changhao Yan, Jun Tao, Xuan Zeng
2009 Proceedings of the 46th Annual Design Automation Conference on ZZZ - DAC '09  
To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous researches formulated the dummy fill problem as a standard Linear Program (LP). However, solving the huge linear program formed by real-life designs is very expensive and has become the hurdle in deploying the technology. Even though there exist efficient heuristics, their performance cannot be guaranteed. In this paper, we
more » ... a dummy fill algorithm that is both efficient and with provably good performance. It is based on a fully polynomial time approximation scheme by Fleischer [4] for covering LP problems. Furthermore, based on the approximation algorithm, we also propose a new greedy iterative algorithm to achieve high quality solutions more efficiently than previous Monte-Carlo based heuristic methods. Experimental results demonstrate the effectiveness and efficiency of our algorithms.
doi:10.1145/1629911.1630052 dblp:conf/dac/FengZYTZ09 fatcat:xko7uaaqz5hfpk2pl7uhlt2pqq