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Fabrication of MRAM-type Structure and Their Magnetic Properties
MRAM型構造の作製と磁気特性
2001
Journal of the Society of Materials Engineering for Resources of Japan
MRAM型構造の作製と磁気特性
The characteristic points of MRAM are compared with those of DRAM, Flash memory, SRAM, and FeRAM. The differences in PSV-MRAM and MTJ-MRAM are discussed in terms of the directions of sense current, CIP or CPP, and connections of CMOS with MR elements. An MRAM-type structure was accomplished with three layers of PSV element, NiFe soft layer (6nm) /Cu non-magnetic layer (3-6nm) /Co hard magnetic layer (4nm) on Si-wafer. Each PSV element of 80nm X 150nm was sandwiched by a sense line and a word
doi:10.5188/jsmerj.14.43
fatcat:acqsuuol7rcqtkavz6nonjmbkq