The Importance of OH groups Containing in Solid Films for High Sensitivity of Chemically Amplified Resists

Yoshinori Hirano, Norihito Ohmori, Noriaki Okimoto, Masayuki Hata, Tyuji Hoshino, Minoru Tsuda
2000 Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)  
doi:10.2494/photopolymer.13.503 fatcat:5n2t3asiyrhzfbenixezoufebq