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Series of thin films of single-, bi-and tri-layered structure consisting of Ti, V, TiO 2 and V 2 O 5 layer and/or mixed TieVeNi layer with different layer sequences and thicknesses were prepared by the sputtering technique on Si and SiO 2 substrates. The layer chemical composition and thickness were determined by a combined analysis of X-ray diffraction, X-ray reflectometry, Rutherford backscattering and optical reflectivity spectra. The films were hydrogenated at 1 bar at 300 C and/or at highdoi:10.1016/j.jsamd.2016.05.003 fatcat:g26eabm5dvfepnm46lxifr75fu