The purpose of this review is to create a high density Nanopattern using Nanosphere Lithography which can be used in photonics application, sensors or electronics industry. There are several ways to create high density Nanopatterns using Nanolithography. Nanolithography involves the use of colloids which are deposited on a flat substrate using several different techniques such as spin coating, dipcoating, Langmuir Blott Technique and Template Directed Colloidal Self Assembly. The technique that

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... leads to the best results are the ones that lead to an ordered structure on a larger scale through the template directed colloidal self assembly. Therefore when it comes to designing a high density Nanopattern it is better to use the template directed colloidal design. If one wants a specific pattern there are several different techniques one can use to achieve a nanopattern with a specific design. This is done by further tailoring the polystyrene spheres through Metal dot catalyzed CVD, Selective etching Solution growth, On sphere gas phase deposition, Shadowed oblique angle deposition etc. With each of these techniques different patterns can be achieved such as a hexagonal closed pack array, Nanogaps, Nanochain etc. Recently self assembled colloidal crystal monolayers composed of polystyrene spheres or silica have been used to fabricate ordered arrays with well defined nanostructures because of their flexibility and controllable parameters [1] . For the most part these templates are in hexagonal closed packed or non-close packed pattern on substrates which can be used for surface enhanced Raman scattering, antireflective coating, photonic crystals and as flexible templates to fabricate one dimensional nanostructure arrays. The structure of these