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Enhancement in Ferroelectric Properties of Pb(Zr[sub 0.4]Ti[sub 0.6])O[sub 3] Thin-Film Capacitors with PtO[sub x] Electrodes
2006
Journal of the Electrochemical Society
The characteristics of sputtered PtO x electrodes and the ferroelectric reliability of Pb͑Zr 0.4 Ti 0.6 ͒O 3 ͑PZT͒ thin-film capacitors for memory application in relation to the oxygen content in the electrodes were investigated. The PZT thin films of 130 nm thickness were deposited on PtO x electrodes. Both Pt and PtO phases coexist and a compressive stress is also induced in the electrode after rapid thermal annealing ͑RTA͒ at 600°C. The polarization-switching characteristics, including
doi:10.1149/1.2192747
fatcat:hvo63nvywjg6dj46yk6dz3yd5u