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Fabrication of Tin Oxide Thin Film Transistors by RF Magnetron Sputtering Using Sn/SnO Composite Target
2018
Advances in Materials
P-type tin oxide thin film deposited by RF sputtering for transparent thin film transistor (TFT) applications is the subject of this study. P-type tin oxide thin film can be made by doping a cation with a lower valence into n-type SnO 2 as an acceptor impurity or by fabrication with tin monoxide (SnO). The later method was investigated in this study by RF magnetron sputtering process, which has a high deposition rate, uniform thickness control, simple stoichiometry control, and reproducibility.
doi:10.11648/j.am.20180703.13
fatcat:jzeprvo2rzhuxd3fwdxmwdfkji