A copy of this work was available on the public web and has been preserved in the Wayback Machine. The capture dates from 2018; you can also visit the original URL.
The file type is
TEMPERATURE RISE OF FILM CONDENSATION SUR-FACE AS A PHENOMENON INTRINSIC TO VACUUM DEPOSITION METHODS
Nanomaterials: Applications and Properties (NAP-2011)
By means of in situ measurement of the temperature of condensation surface by two independent methods during deposition of various materials by magnetron sputtering it was revealed that it is noticeably higher than that of the substrate and linearly increases with increasing of the deposition rate of the film. This effect is explained by the idea that intermediate liquid-like layer forms on the boundary between the vapor and solid (film) phases, that exists exceptionally during arrival offatcat:pw6w57e2rfhxbayiuxrkcnbe74