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Application of measurement configuration optimization for accurate metrology of sub-wavelength dimensions in multilayer gratings using optical scatterometry
2016
Applied Optics
Critical dimension measurement accuracy in optical scatterometry relies not only on the systematic noise level of instruments and the reliability of forward modeling algorithms, but also heavily on the measurement configuration. To construct a set of potentially high-accuracy configurations, we apply a general measurement configuration optimization method based on error propagation theory and singular value decomposition, by which the measurement accuracy is approximated as a function of a
doi:10.1364/ao.55.006844
pmid:27607258
fatcat:xykisegoefatla2hnwcavgffdq