Self limiting atomic layer deposition of Al2O3 on perovskite surfaces: a reality?

Devika Choudhury, Gopalan Rajaraman, Shaibal K. Sarkar
2016 Nanoscale  
The feasibility of self-saturated atomic layer deposition of Al2O3 on an organolead halide perovskite (MAPbI3−xClx) surface through a well known trimethylaluminium (TMA)–water (H2O) chemistry is studied.
doi:10.1039/c5nr06974b pmid:26987744 fatcat:kf6z6dukgnfklo5yckbpq3xxea