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Self limiting atomic layer deposition of Al2O3 on perovskite surfaces: a reality?
2016
Nanoscale
Preserved Fulltext
The feasibility of self-saturated atomic layer deposition of Al2O3 on an organolead halide perovskite (MAPbI3−xClx) surface through a well known trimethylaluminium (TMA)–water (H2O) chemistry is studied.
doi:10.1039/c5nr06974b
pmid:26987744
fatcat:kf6z6dukgnfklo5yckbpq3xxea