Thermal stability and electrical characteristics of ultrathin hafnium oxide gate dielectric reoxidized with rapid thermal annealing

Byoung Hun Lee, Laegu Kang, Renee Nieh, Wen-Jie Qi, Jack C. Lee
2000 Applied Physics Letters  
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doi:10.1063/1.126214 fatcat:acw4hyc3vbcjncvakymqjrh4au