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1998 Solid-State, Actuators, and Microsystems Workshop Technical Digest
We have used anisotropic etching and subsequent polysilicon surface micromachining in a new process to produce actuated blaze gratings. Using the etch properties of KOH in single-crystal (100)-oriented silicon, we obtain repeatable 54.7° blaze angles in the gratings by making use of the etched grooves as a mold for LPCVD-deposited polycyrstalline silicon. The designer can vary the grating period using conventional lithography techniques. After producing the grating structure in conventionaldoi:10.31438/trf.hh1998a.5 fatcat:h7wrm3xkwvgh3odwbi2dxumdlu