Submicrometer linewidth metrology in the optical microscope

D. Nyyssonen, R.D. Larrabee
1987 Journal of Research of the National Bureau of Standards  
Until relatively recently, opticallinewidth measurement systems were the only practical tools for monitoring feature sizes produced by lithographic processes. With the shrinking of feature dimensions to the submicrometer level, and the concern over diffraction and wavelength limitations of optical tools, many fabrication lines jumped to scanning electron microscope (SEM) measurement tools as the panacea to all of the problems and limitations of existing optical systems. In response, new optical
more » ... sponse, new optical systems have appeared including ultraviolet and laser scanning systems. This paper and an accompanying paper on SEM systems in this issue of the Journal of Research [1]1, assess the capabilities and limitations of each of these technologies and look at how well they will be able to meet the measurement needs of present and future semiconductor processing technologies.
doi:10.6028/jres.092.017 fatcat:mazkb4rcmfal7bii34nuhdazzq