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Acid-breakable Resin-based Resist for Nanofabrication Electron-beam Lithography
2000
Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)
A new chemical amplification positive resist system designed for nanofabrication electron-beam lithography is described. The positive resist system consists of an acidgenerator and an acid-breakable (AB) resin that can be converted to polyphenol fragments by an acid-catalyzed reaction. The AB resin is synthesized through a co-condensation reaction between polyphenol and aromatic multi-functional vinylether compounds (bisvinylether and trisvinylether compounds). Molecular weight (MW) of the AB
doi:10.2494/photopolymer.13.405
fatcat:kzyk46kjwzblpjc2i5tm7u67tm