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Double patterning of contact array with carbon polymer
2008
Optical Microlithography XXI
The spacer patterning technique (SPT) is well known as one of the methods expanding the resolution limit and mainly useful for patterning line & space of memory device. Although contact array could be achieved by both spacer patterning technique and double exposure & etch technique (DEET) 1 , the former would be preferable to the latter by the issues of overlay burden and resolution limit of isolated contact. The process procedure for contact array is similar to that for line & space which
doi:10.1117/12.771092
fatcat:jhbwkkmhfja2zcfjp66xxqcy3y