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DigitalCommons@UMaine The Design and Fabrication of an Atomic Layer Deposition Reactor for Coating Powders THE DESIGN AND FABRICATION OF AN ATOMIC LAYER DEPOSITION REACTOR FOR COATING POWDERS
Atomic layer deposition (ALD) is a self-limiting synthesis technique for the growth of conformal ultrathin films on solid state materials. The high conformality of the ALD method is ideal for coating porous, high surface area materials. A fluidized bed reactor (FBR) was designed and built for functionalizing a powder using ALD. The particle bed was fluidized using an inert argon gas. Aluminum oxide (Al 2 O 3) was deposited on a high surface area powder substrate, γ-phase aluminum oxide, via ALDfatcat:iy4trczjhbdppgyx63ugfwqb5e