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The Optical Metrology Laboratory at Diamond: pushing the limits of nano-metrology
2019
Advances in Metrology for X-Ray and EUV Optics VIII
We present recent advancements in the Optical Metrology Laboratory (OML) at Diamond Light Source. Improvements in optical manufacturing technology, and demands from beamlines at synchrotron and free electron laser facilities, have made it a necessity to routinely characterize X-ray mirrors with slope errors < 100 nrad rms. The Diamond-NOM profiler can measure large, fully assembled optical systems in a sideways, upwards, or downwards facing geometry. Examples are provided of how it has recently
doi:10.1117/12.2529401
fatcat:qsvwbgsdg5g3bbw5s3nr6z74cm