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CMOS Devices and Beyond — A Process Integration Perspective
AIP Conference Proceedings
Development of CMOS technology is approaching severe technological limits in the next 10 -15 years. Overcoming these limits will demand introduction of new manufacturable materials and device structures to extend the speed of silicon integrated circuits at the historical rate of 17 % per year to the end of the 2001 International Technology Roadmap for Semiconductors (2016). Following a brief discussion of these limits, this paper will review the most promising approaches to new materials,doi:10.1063/1.1622454 fatcat:ymqgdwa73rd65pdvcjsi6bodge