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Herein we demonstrate a simplified, 'poor-man's' form of the Atomic Layer Deposition (ALD) technique to grow uniform silica multilayers onto hydrophilic surfaces at low temperatures, including room temperature (RT). Tetramethoxysilane vapor is used alternately with ammonia vapor as a catalyst, with very common benchtop lab equipment in an ambient environment. This deposition method could be applied in a wide range of fields for growing nanoscale layers of silica from an inexpensive vapordoi:10.1039/c0jm00696c fatcat:i46hi3tspnfc7dbwp7z7obarja