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This letter reports the design, fabrication, and operation of a microlens scanner that can perform large vertical scans at low actuation voltages. Photoresist (PR) reflow technique was used to form a 210-m-diameter PR microlens on a lens holder which is integrated with a large-vertical-displacement (LVD) microactuator. The lens holder is fabricated using a maskless deep-reactive-ion-etch complementary-metal-oxide-semiconductor microelectromechanical systems process. A maximum static verticaldoi:10.1109/lpt.2005.853223 fatcat:janlisovxrhfdk4mpnqk7jv5mq