Formation of Patterned Sapphire Substrate using UV Imprint Processes

Hidetoshi Shinohara, Shigeru Fujiwara, Takaharu Tashiro, Hidetoshi Kitahara, Hiroshi Goto
2013 Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)  
This paper presents a fabrication process of microscale patterned sapphire substrates (PSSs). The resin mold was fabricated precisely by UV roll-to-roll (RtR) imprinting. Pillar pattern were UV-imprinted on a sapphire wafer by using the mold. PSS were formed on the 2-inch and 4-inch entire wafer areas by BCl 3 -based reactive ion etching. The height and bottom diameter of the conical structure in a 2-inch sapphire wafer were 1.73 μm and 2.67 μm, respectively.
doi:10.2494/photopolymer.26.113 fatcat:smppyucy6fba5dpzoqgbmyes5u