Determination of Residual Stress Fields in a Thermally Grown Oxide under Thermal Cycling Loadings, Using XRD and Raman Spectroscopy — Correlations with Microstructural States

Felaniaina Rakotovao, Zhao Jun Tao, Jean Luc Grosseau-Poussard, Benoit Panicaud, Gilles Bonnet, Patrick Girault, Mathieu Guerain
2014 Advanced Materials Research  
The presence of residual stresses in thermal oxide layers has been recognized for a long time. In the present work, the mechanical fields for chromia oxide are determined either by XRD or Raman spectroscopy. In addition, the microstructure of the chromia films is investigated ant its influence on the evolution of the stress release processes is analyzed.
doi:10.4028/www.scientific.net/amr.996.890 fatcat:wtrgx6crsrhk7cphnaztu3sf4e