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Interfacial Electronic Structure and Full Spectral Hamaker Constants of Si3N4 Intergranular Films from VUV and Sr-Veel Spectroscopy
Materials Research Society Symposium Proceedings
The interfacial electronic structure, presented as the interband transition strength Jcv(wo) of the interatomic bonds, can be determined by Kramers Kronig (KK) analysis of vacuum ultraviolet (VUV) reflectance or spatially resolved valence electron energy loss (SR-VEEL) spectra. For the wetted interfaces in Si 3 N 4 , equilibrium thin glass films are formed whose thickness is determined by a force balance between attractive and repulsive force terms. KK analysis of Jcv(co) to yield 62() for thedoi:10.1557/proc-357-243 fatcat:6qwpuwg45be3bnmouiayx5if5y