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Deposition of Transparent Boron Nitride Thin Film in a Microwave Discharge
1988
Electrochemistry
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Transparent boron nitride thin films were deposited on fused silica and silicOn substra七es by the reactiQn Qf B2H6 with nitrogen in a microwave discharge。 The depQsit by the discharge for l h was identi− fied as hexagonal BN by IR, XPS, and X−ray diffraction。 The film depositedl on 七he fused silica substra七e was transparent and 七he ab− sorption was observed from 260
doi:10.5796/kogyobutsurikagaku.56.478
fatcat:gjgnwaaz6zb7fc42jlzggk4lhi