Deposition of Transparent Boron Nitride Thin Film in a Microwave Discharge

Osamu MATSUMOTO, Chikara INAGAKI, Haruo UYAMA
1988 Electrochemistry  
Transparent boron nitride thin films were deposited on fused silica and silicOn substra七es by the reactiQn Qf B2H6 with nitrogen in a microwave discharge。 The depQsit by the discharge for l h was identi− fied as hexagonal BN by IR, XPS, and X−ray diffraction。 The film depositedl on 七he fused silica substra七e was transparent and 七he ab− sorption was observed from 260
doi:10.5796/kogyobutsurikagaku.56.478 fatcat:gjgnwaaz6zb7fc42jlzggk4lhi