Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst

Masashi Yamamoto, Shiro Nagaoka, Hironobu Umemoto, Keisuke Ohdaira, Takashi Nishiyama, Hideo Horibe
2017 International Journal of Polymer Science  
We examined an environmentally friendly photoresist removal method using H radicals produced by decomposing hydrogen on a hot iridium catalyst. We examined the relationship between photoresist removal rate and its surface temperature using thin film interference and the removal properties using H radicals produced by the Ir catalyst. Decomposition behavior at polymer surface by radicals may be analyzed in further detail from the aspect of kinetics. Additionally, we investigated the oxygen
more » ... ed the oxygen addition effects on the removal rate. The photoresist removal rate increased with the oxygen additive amount and then decreased more gradually than in the case of using W filament. The increasing behavior was similar but there was a large difference between W and Ir catalyst in the decreasing behavior.
doi:10.1155/2017/2983042 fatcat:gxlosdirgzcbvimrx3xpqrvaie