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Si CMOS Extension and Ge Technology Perspectives Forecast Through Metal-oxide-semiconductor Junctionless Field-effect Transistor
JSTS Journal of Semiconductor Technology and Science
Applications of Si have been increasingly exploited and extended to More-Moore, More-than-Moore, and beyond-CMOS approaches. Ge is regarded as one of the supplements for Si owing to its higher carrier mobilities and peculiar band structure, facilitating both advanced and optical applications. As an emerging metal-oxide device, the junctionless fieldeffect transistor (JLFET) has drawn considerable attention because of its simple process, less performance fluctuation, and stronger immunitydoi:10.5573/jsts.2016.16.6.847 fatcat:rn7jbnfxdfgvvjauqdqkakczwe