Defect tolerant extreme ultraviolet lithography technique

Lukasz Urbanski, Wei Li, Jorge J. Rocca, Carmen S. Menoni, Mario C. Marconi, Artak Isoyan, Aaron Stein
2012 Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics  
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more » ... pect-ratio trench etching at controllable angles using ballistic reactive ion etching J. Vac. Sci. Technol. B 31, 010604 (2013) Influence of secondary electrons in high-energy electron beam lithography A defect tolerant method of printing periodic structures with submicron resolution is presented. This technique is based on the self-imaging effect produced when a periodic semi-transparent mask is illuminated with coherent light. An analytical description of the effect, numerical simulations, and experimental evidence that is in good agreement with the theoretical analysis is presented. To explore the extent of defect tolerance, masks with different defect layouts were designed and tested.
doi:10.1116/1.4758758 fatcat:ftwgcn4hejcrtfuu22asonyloi