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The stability of the photonic properties of Si-infiltrated opals for fabrication disorder is tested with following models of applied imperfections: deviations in radii of spheres, deviations in spheres positions and both of them. The deviations are assumed to be distributed accordingly to the normal law and to the skewed distribution experimentally observed in the process of production of polymer self-assembled crystals. The criteria for the photonic crystals tolerances are evaluated versus thedoi:10.1364/oe.17.000747 pmid:19158888 fatcat:od533zfp45bsfag7lvkov5xgw4